Summer Issue 2014

PRODUCT SPOTLIGHT: 5D Patterning Control Solution

KLA is driving improved patterning by addressing five elements of patterning control ─ the three geometrical dimensions of device structures, time-to-results and overall equipment efficiency. New systems drive performance throughout the fab ─ WaferSight^TM PWG patterned wafer geometry measurement system, LMS IPRO6 reticle pattern placement metrology system, and K-T Analyzer^® 9.0 advanced data analysis system.