Articles about 'Lithography Users’ Forum'
Summer Issue 2011 12 July, 2011
SPOTLIGHT: 2011 Lithography Users’ Forum Keynote Presentation
Coinciding with the 2011 SPIE Advanced Lithography exhibition, KLA hosted its one-of-a-kind Lithography Users' Forum (LUF). Annually, this event brings together the industry’s leading lithographers for networking, information sharing, and discussions surrounding challenges facing the industry and possible solutions.
Spring Issue 2010 28 April, 2010
SPOTLIGHT: 2010 Lithography Users' Forum
Over 300 technologists, scientists and engineers gathered in San Jose, California on February 21st to attend KLA’s 11th Annual Lithography Users’ Forum. This annual event serves as a sneak peek at more than 20 technical papers co-authored by KLA engineers and customers presented at SPIE’s Advanced Lithography conference. The forum covered current metrology and inspection challenges associated with today’s advanced lithography processes, and KLA’s solutions to those challenges. The event highlight was the keynote, “EUV, EBDW—ArF Replacement or Extension?” presented by Yan Borodovsky, director of the Advanced Lithography Technology, Manufacturing Group at Intel Corp.