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Articles about 'Sampling'

Current Issue

02 November, 2017
Sampling - YMS MagazineSampling - YMS Magazine

FUNDAMENTALS OF PROCESS CONTROL

This is the introduction to a series of 10 installments which will discuss fundamental truths about process control—inspection and metrology—for the semiconductor industry.
By fundamental, we imply the following:

  • Unassailable: They are self-evident, can be proven from first principles, or are supported by the dominant behavior at fabs worldwide
  • Unchanging: These concepts are equally true today for 28nm as they were 15 years ago for 0.25μm, and are expected to hold true in the future
  • Universal: They are not unique to a specific segment of process control; rather they apply to process control as a group, as well as to each individual component of process control within the fab
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Spring Issue 2000

10 April, 2000 Spring 2000 Volume 2, Issue 2

Preview the interactive digital publishing of YMS Magazine to simulate the experience of reading a print publication online.

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Spring Issue 2001

09 April, 2001 Spring 2001 Volume 3, Issue 2

Preview the interactive digital publishing of YMS Magazine to simulate the experience of reading a print publication online.

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Spring Issue 2010

28 April, 2010

SPOTLIGHT: 2010 Lithography Users' Forum

Over 300 technologists, scientists and engineers gathered in San Jose, California on February 21st to attend KLA-Tencor’s 11th Annual Lithography Users’ Forum. This annual event serves as a sneak peek at more than 20 technical papers co-authored by KLA-Tencor engineers and customers presented at SPIE’s Advanced Lithography conference. The forum covered current metrology and inspection challenges associated with today’s advanced lithography processes, and KLA-Tencor’s solutions to those challenges. The event highlight was the keynote, “EUV, EBDW—ArF Replacement or Extension?” presented by Yan Borodovsky, director of the Advanced Lithography Technology, Manufacturing Group at Intel Corp.

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