Summer Issue 2008

4 August, 2008

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DEFECT MANAGEMENT

- Advances in SEM Review for Efficient Generation of Meaningful Paretos

- Using Design Based Binning to Improve Defect Excursion Control for 45nm Production

- Defect Criticality Index (DCI): A New Methodology to Significantly Improve DOI Sampling Rate in a 45

- A Novel Method of Characterizing Post-Laser Anneal Surface Conditions for the 45nm Process Technolog

- Automatic Optimization of MEEF-driven Defect Disposition for Contamination Inspection Challenges

FAB ECONOMICS

- A New Decision Paradigm for Comparing Patterned Wafer Inspectors

INSPECTION

- Influence of Immersion Lithography on Wafer Edge Defectivity

METROLOGY

- Predicting Electrical Measurements by Applying Scatterometry to Complex Spacer Structures Product News

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