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CURRENT ISSUE - ASMC 2011 |
![]() ASMC 2010 Best Paper WinnerEach year at the Advanced Semiconductor Manufacturing Conference (ASMC), best paper awards for the conference- one professional, one student - are selected by the technical and steering committee members and presented at the start of the next year's event. This year at ASMC 2011 held in Saratoga Springs, NY, the best professional paper for ASMC 2010, sponsored by Entegris, was awarded to: Sridhar Ramaswamy, Michael Guse, Michael Linnane, IBM Corporation; Nithin Yathapu, Bill Peterson KLA-Tencor Corporation; Gerhard Lembach GLOBALFOUNDRIES for their paper, "Leveraging Blanket Wafer Film Inspection to Efficiently Characterize Root Cause for Lithographic Micro-Masking Patterning Defects". Congratulations!
Inline Control of an Ultra Low-k ILD layer using Broadband Spectroscopic EllipsometrySemiconductor manufacturers are driven to an aggressive roadmap to improve device performance in order to remain competitive and provide technology that enables complex computations... Read More PDF > Automated Systematic Discovery for Development and Production |

